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C.-T. Huang, J.-Y. Li, J.C. Sturm, "High Breakdown Voltage Schottky Gating of Doped Si/SiGe 2DEG Systems Enabled by Suppression of Phosphorus Surface Segregation", International Silicon-Germanium Technology and Device Meeting (ISTDM), 10.1109/ISTDM.2012.6222514 pp. 1-2 Berkeley, CA JUN (2012).
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